scia Systems is a German full range supplier of advanced ion beam and plasma processing equipment. The systems are applicable for coating, etching and cleaning processes in the production of microelectronics, MEMS and precision optical components, in both, high volume production as well as research and development environments.
Due to their flexible and modular design, the systems can be configured according to customer specific requirements. Amongst others by combining several vacuum process chambers into cluster or in-line solutions. Together with our worldwide service partners, we offer comprehensive service and superior technology support.
scia Systems offers equipment for several coating, etching and cleaning processes, used for the following applications:
Dual ion beam sputtering system for substrates up to 200 mm. A rotational target holder allows in-situ change of up to 5 different target materials.
System for RIE and PECVD processes on substrates up to 750 mm x 750 mm. The system enables large area processing with an array of synchronized linear microwave sources.
Ion Beam Etching system for full surface etching with tiltable and rotatable substrate holder for etching angle adjustment. Compact design usable for both, small scale production as well as research and development.
Technical Sales Manager
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