EITRE^®

An easy-to-use semi-automated and affordable range of tools for substrate sizes up to 8” x 8”, allowing pattern replication on the micro- and nanometer scale. The EITRE^® systems are particularly versatile because of the multiple imprint process capabilities and the wide range of configuration possibilities.

EITRE^® Large Substrates

Nanoimprint tool for substrates up to 500 x 500 mm. This semi-automated tool enables high accuracy patterns with resolutions down to 50 nm  to be replicated large substrates with excellent repeatability. The system offers the highest possible flexibility using different imprint processes in the same equipment, allowing a wide range of materials to be used.