SINDRE^® Integra

A fully automated nanoimprint lithography tool suitable for high-volume manufacturing within several application areas with throughput of up to 70 WPH. Allows for imprint size up to 12” wafers. Because of its high repeatability, low maintenance cost and high yield the SINDRE^® Integra tool provides a competitive Cost-of-Ownership

SINDRE^® Litho Track

Fully integrated and automated NIL system with substrate clean, coat and thermal processing in one and the same tool and with throughput up to 30 WPH. Allows for imprint sizes up to 12” wafers and larger substrates on request.